Gas Purification and Special Gas Impurity Removal-Adsorption

Gas purification and special gas impurity removal - adsorbing polycrystalline silicon, gray metallic luster, soluble in a mixture of hydrofluoric acid and nitric acid, insoluble in water, nitric acid, and hydrochloric acid. Under high temperature melting conditions, it has significant chemical reactivity and can interact with almost any material. It has semiconductor properties and is an extremely important excellent semiconductor material. However, trace impurities can greatly affect its conductivity.

Widely used in the electronics industry to manufacture various products, it is obtained by chlorination of dry silicon powder and dry hydrogen chloride gas under certain conditions, followed by condensation, distillation, and reduction.

Polycrystalline silicon is the direct raw material for producing monocrystalline silicon, and is the electronic information foundation material for contemporary semiconductor devices such as artificial intelligence, automatic control, information processing, and photoelectric conversion. It is known as the cornerstone of the microelectronics building.

In the production process, due to the presence of gas impurities, the harm to semiconductor materials is also significant. In order to obtain high-quality polycrystalline silicon and monocrystalline silicon, the gas must be purified before use. There are many methods of purification, and in gas purification technology, the following knowledge is often comprehensively applied.

Absorb with hygroscopic liquid desiccants (liquid alkali, sulfuric acid, etc.).

Chemical absorption using solid desiccants such as KOH, CuSO4, CaCl2, magnesium perchlorate, and physical absorption using silica gel, molecular sieve, etc.

Using catalysts for chemical catalysis.

Freezing at low temperatures using refrigerants or refrigerants (such as liquid nitrogen).

There are many types of adsorbents, and currently the most widely used in China's semiconductor industry is still silica gel molecular sieve ester adsorbents.

Chemical catalytic reaction refers to the process in which harmful impurities present in a gas cannot be removed from the gas by physical means, but are adsorbed onto the surface of the catalyst through the action of a catalyst, causing the impurities to react with other components in the gas and transform into harmless compounds. This method is called chemical catalysis.

The gas purification and special gas impurity removal developed by Haipu - adsorption process, using independently developed adsorption catalytic products, can specifically solve gas purification and special gas impurity removal in the semiconductor industry.