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Wastewater Treatment in the Semiconductor Industry

In the production process of wafer manufacturing plants in the semiconductor industry, semiconductor production requires complex manufacturing processes with very high quality standards (such as chemical mechanical polishing (CMP)), resulting in various types of production wastewater.


At present, there are three main types of production wastewater in the semiconductor industry, namely fluorine-containing wastewater, copper containing wastewater, and ammonia containing wastewater. These three types of wastewater have a serious impact on the environment due to their complex water quality and high pollutant content. Strengthening the treatment of semiconductor production wastewater is an urgent environmental problem that enterprises need to solve.


Treatment of Fluorinated Wastewater from Semiconductors


Based on the characteristics of fluorine-containing wastewater and the physicochemical properties of fluoride ions, Haipu has developed a series of high-performance fluoride removal adsorbents (as shown in Figure 3). In addition to being used for standard treatment of conventional fluorine-containing wastewater, they can also be used for high fluoride and high salt feed solutions to meet customer production needs.


A high fluoride wastewater was generated during the production of a certain agricultural chemical enterprise, which needs to be treated to meet the standard. After being treated with our special adsorbent, the data is shown in Table 1 below.

Fluorine concentration in raw waterCustomer demand for effluent fluoride concentrationFluorine concentration in effluent treated with Haipu adsorbent
320ppm<1ppm0.15ppm


A certain lithium battery recycling enterprise produces two streams of high fluoride and high salt material liquids during the recycling of valuable metal resources, which require defluorination treatment and do not introduce other ions.



Fluorine concentration in raw waterCustomer demand for effluent fluoride concentrationFluorine concentration in effluent treated with Haipu adsorbent
High fluorine liquid 13232ppm<40ppm1.25ppm
High fluorine liquid 2930ppm<60ppm0.25ppm


After treatment with our highly selective defluorination adsorbent, the relevant data is shown in Table 2


As shown in Table 2, the Haipu defluorination adsorbent has excellent performance. In addition, multiple batches of stability tests were conducted on the relevant adsorbents.


Copper removal treatment of semiconductor wastewater


Haipu copper removal resin can deeply adsorb and remove copper from wastewater, and the removal rate of copper ions is stable at over 90%. When combined with relevant adsorption processes to treat wastewater, most of the copper ions in the wastewater are adsorbed and removed, and the copper ions are transferred to the desorption solution, which facilitates the subsequent recovery of by-products, meets customer discharge requirements, and does not produce secondary pollution, ensuring the normal operation of the enterprise.


Haipu copper removal resin products and their supporting combination processes have helped multiple customers meet their copper containing wastewater treatment needs.


A new copper acid water adsorption treatment facility will be built, with a total designed wastewater treatment capacity of 100m ³/d. The high copper ion content in the copper acid water cannot meet production requirements and affects the stable production of the enterprise.


Haipu selected copper removal resin and customized the process design for the wastewater. The wastewater design indicators are shown in the table below.

IndicatorWater volume (m³/d)Copper ion (mg/L)
Absorb incoming water1005590
Adsorbed water100<500


From left to right, they are raw water, effluent, desorption solution, and washing solution

From left to right, they are raw water, effluent, desorption solution, and washing solution


The wastewater generated in the electroplating workshop contains 5-10 mg/L copper, which cannot be discharged in compliance with standards. Treatment requirements: copper<0.3 mg/L.


The processing result is as follows


Water volume (m³/d)Copper (mg/L)pH
Raw water300 t/d6.48 ppm~6
Effluent300 t/d~0.2~6


Removing Ammonia Nitrogen from Semiconductor Wastewater


A company requires that the ammonia nitrogen content in the treated wastewater be below 20 mg/L. The experimental treatment effect shows that using Haipu ammonia nitrogen adsorbent for adsorption treatment can stabilize the ammonia nitrogen removal rate in the wastewater at over 90%, and the ammonia nitrogen content in the effluent can be controlled below 10 mg/L.


Keeping a certain safety margin while ensuring compliance with customer requirements can effectively prevent water quality fluctuations in the incoming wastewater from causing substandard effluent.


Innovative Materials Technology/Service Energy Metals/Leading the Resource Cycle


Service Process


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